Leti has integrated hybrid III-V silicon lasers on 200mm wafers using standard CMOS process flow. This shows the way to transitioning away from 100mm wafers and a process based on bulk III-V ...
Developed technology in TowerJazz commercial foundry opens multi-billion markets requiring specific components able to withstand high dose radiation Applications include electronics for communication, ...
Spirea AB is a Swedish fabless semiconductor company developing highly integrated low-power, low-cost radio solutions for the Wireless LAN and PAN markets. This article describes how we assembled a ...
The manufacturing process flow has been designed to allow all standard CMOS steps to occur at the front end of the process, with the micromachining steps performed after the circuitry is completed.
—The development of a process flow capable of demonstrating functionality of a monolithic complementary FET (CFET) transistor architecture is complex due to the need to vertically separate nMOS and ...
French research group Leti has demonstrated a III-V semiconductor fabrication technique which it says will simplify the production of lasers. Leti says it has integrated hybrid III-V silicon lasers on ...
The International Electron Devices Meeting (IEDM) held Dec. 2-6, 2017, in San Francisco offered imec and Leti an opportunity to disclose several innovations. imec announced three new developments: ...
(Nanowerk News) At today's VLSI Symposium, IMEC reports an improved performance for its planar CMOS using hafnium-based high-k dielectrics and tantalum-based metal gates for the 32nm CMOS node. The ...
IMEC, the Belgium-based nanotechnology research center, announced at this week's VLSI Symposium that it has improved the performance of its planar CMOS using hafnium-based, high-k dielectrics and ...
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